Synthesis characterization and lithographic evaluation of plasma polymerized α-methylstyrene and chlorinated α-methylstyrene as e-beam resist Gosavi, Suresh
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TextPublication details: Pune Savitribai Phule Pune University 1995Subject(s): Vlsi manufacturing technology||Resist synthesis||E-beam lithography||Pattern inspection||Ftir techniqueOnline resources: Click here to access online
| Item type | Current library | Home library | Call number | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|---|
| Thesis | Jayakar Knowledge Resource Centre | Jayakar Knowledge Resource Centre | Available |
Total holds: 0
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